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Last Updated Saturday, October 10 2015

Shipley patents

Published June 13, 2006
Patent No. U.S. 7,026,101 B2
Shipley Company, LLC, has obtained a patent for a coated substrate comprised of an antireflective composition layer comprising as separate components a basic material, a crosslinker, an acid or acid generator compound, and a resin, and a photoresist layer over the antireflective composition layer. The photoresist is comprised of a resin that comprises photoacid-labile acetal or ketal groups.

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