Shipley patents

June 13, 2006

Patent No. U.S. 7,026,101 B2
Shipley Company, LLC, has obtained a patent for a coated substrate comprised of an antireflective composition layer comprising as separate components a basic material, a crosslinker, an acid or acid generator compound, and a resin, and a photoresist layer over the antireflective composition layer. The photoresist is comprised of a resin that comprises photoacid-labile acetal or ketal groups.