Patent No. U.S. 6,946,498 B2
Nippon Arc Co., Ltd. has received a patent for a coating composition comprised of an anionic surfactant comprising a sulfonic acid salt; inorganic oxide microparticles; a silicon compound, having one acryl group or methacryl group and a hydrolyzable group, or a hydrolysate of the compound; a compound having at least two photopolymerizable unsaturated groups; and a photopolymerization initiator.
Published June 13, 2006
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