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Last Updated Thursday, June 20 2013
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Nippon patents



Description:
Patent No. U.S. 6,946,498 B2
Nippon Arc Co., Ltd. has received a patent for a coating composition comprised of an anionic surfactant comprising a sulfonic acid salt; inorganic oxide microparticles; a silicon compound, having one acryl group or methacryl group and a hydrolyzable group, or a hydrolysate of the compound; a compound having at least two photopolymerizable unsaturated groups; and a photopolymerization initiator.


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