The Future of Dry-Film Protection
- Troy will be featuring its advanced dry-film preservatives for Europe, including its broad line of new, innovative Controlled Release products based on the company’s next generation microencapsulation technology
- This range of Polyphase and Troysan CR preservatives offers highly effective protection against fungi and algae, with remarkably long-lasting performance
- Troy’s new CR preservatives also feature enhanced resistance to leaching, which benefits not only performance, but also the environment
Navigating a New Course?
Troy will also be presenting its line of advanced Mergal and Nuosept MIT-free wet-state preservatives for European manufacturers. With full regulatory compliance, excellent proven performance against microbial contamination, and low cost-in-use, Troy’s MIT-free wet-state preservatives offer excellent solutions to the challenges European manufacturers face.
Featured at ECS 2019 is advanced Mergal ZBIT, an MIT-free wet-state preservative offering long-lasting, broad-spectrum protection against bacteria, fungi, and yeast. Mergal ZBIT is suitable for a wide range of systems.
Set a Course for More Solutions
The Troy exhibit at ECS will showcase the company’s full portfolio of performance additives as well as metal carboxylates. Featured is Troy’s new, advanced multifunctional dispersant, Troysperse ZWD8, a 100% active, polymeric wetting and dispersing additive for titanium dioxide and inorganic pigments in aqueous coating applications.
Troysperse ZWD8 is especially effective in high performance systems which require properties such as high gloss, improved durability and excellent color uniformity.
The Troy exhibit at this year’s ECS will be an important destination for formulators seeking solutions, said Troy’s Ulf Becker, managing director, Europe. European coatings manufacturers face many challenges currently but with our premier portfolio of products and services, Troy is in a strong position to navigate them through these uncertainties, toward opportunity and success.